XYZ-ASML News & Signals

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TSMC To Use ASML Photolithography Gear For Next-Gen Chips

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Samsung Electronics and ASML Expand Strategic Collaboration for Next-Generation Semiconductor Manufacturing

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【阿斯麦推进新一代光刻机升级，瞄准大型数据中心芯片市场】金十数据9月8日讯，阿斯麦（ASML）表示，计划与其主要客户合作，开发能够生产最先进芯片制造设备的新方案，以满足英伟达等公司设计的大型数据中心芯片需求。目前ASML生产的被广泛应用的极紫外(EUV)光刻机可制造面积最大约800平方毫米的芯片，ASML即将推出的下一代“高数值孔径”EUV光刻机，能够制造出更为精细的芯片。不过，由于其采用尺寸较小的掩模版，目前在可制造芯片面积方面受到限制。ASML计划到2031年展示采用更大尺寸掩模版的试验生产线，并在2033年使这项新技术具备大规模量产能力。

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Samsung Electronics and Asml Expand Strategic Collaboration for Next-Generation Semiconductor Manufacturing

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ASML to work with major chipmakers to use latest tools for larger chips

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ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV

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ASML to work with major chipmakers to use latest tools for larger chips

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Asml - TSMC Intends to Use Asml’s High Na Technology in High-Volume Manufacturing for Advanced Nodes Starting in 2030

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Asml - Transition to Larger, 12-Inch Masks is Expected to Further Increase Fab Productivity, Lower Chipmaking Costs and Remove Stitching Constraints

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ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV

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Asml Holding Nv - TSMC and Asml Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High Na Euv

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Intel Foundry and Asml Collaborate to Accelerate Industry Readiness for High Na Euv

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Intel Foundry and ASML Collaborate to Accelerate Industry Readiness for High NA EUV

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ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV

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ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV

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【美股三大股指涨跌不一】金十数据9月4日讯，美国8月非农大超预期，美股开盘涨跌不一，道指跌0.38%，标普500指数跌0.13%，纳指涨0.02%。明星科技股走势分化，特斯拉(TSLA.O)跌3.5%；甲骨文(ORCL.N)涨3.7%，阿斯麦(ASML.O)涨近2%，英伟达(NVDA.O)、AMD(AMD.O)涨超1%。

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